Semiconductor device and method for manufacturing the same

ABSTRACT

In a semiconductor device including a semiconductor device chip mounted on a substrate and a solder bump electrode formed on an electrode film of the substrate, a pillar-form conductive paste is formed on a first surface portion of the electrode film, and a solder bump electrode is formed to cover the pillar-form conductive paste and a second surface portion of the electrode film on which the pillar-form conductive paste is not formed. With this arrangement, it is possible to realize a predetermined bump height, and also to prevent a bump from collapsing at the time of mounting.

This application is a divisional of application Ser. No. 08,826,045filed Mar. 28, 1997, now U.S. Pat. No. 6,028,357.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device and a method formanufacturing the same, and more specifically to a semiconductor devicehaving a semiconductor device chip mounted on a circuit substrate andencapsulated with resin, and a method for manufacturing the same.

2. Description of Related Art

In a prior art semiconductor device, a method has been performed inwhich a semiconductor device chip is mounted on one principal surface ofa circuit substrate, and solder bump electrodes is formed on the otherprincipal surface of the circuit substrate by locating a solder ball onelectrodes formed on the other principal surface of the circuitsubstrate, and by reflowing the solder ball. This method is widely knownas a BGA (Ball Grid Array). This package is attracting attention, sinceit has a construction fitted to a package required to have a number ofelectrodes.

In the case of forming the solder bump electrodes on the circuitsubstrate as an external electrodes of the package, since the solderbump electrode is required to have a height, a method of directlyputting a solder ball on the electrodes of the circuit substrate hasbeen performed in the prior art.

For example, Japanese Patent Application Pre-examination Publication No.JP-A-02-284426 discloses a method for forming a solder bump electrode ona predetermined electrode by means of a solder immersing method,although it relates to a semiconductor device chip itself.

As shown in FIG. 1, this prior art example is so constructed that analuminum electrode 15 having poor solder wettability is formed on asilicon oxide film 14 formed on a silicon substrate 13, and a wholesurface of the aluminum electrode 15 exposed within an opening formed inan insulator film 16 is covered with a conductive paste 17 having asolder wettability, and an assembly thus formed is immersed into asolder bath so that a solder bump electrode 18 is obtained.

Furthermore, Japanese Patent Application Pre-examination Publication No.JP-A-05-327202 discloses a method for forming a solder bump electrode byprinting a solder paste on a predetermined electrode and shaping it by areflowing.

In the prior art semiconductor device shown in FIG. 1, the conductivepaste is formed on the whole surface of the aluminum electrode havingpoor solder wettability. The reason for this is that it is necessary tocover a large area with the conductive paste, since it is difficult toobtain a sufficient bond strength between a surface of the aluminumelectrode and the conductive paste because an oxide film is formed onthe surface of the aluminum electrode, and since it is also difficult toobtain a sufficient bond strength between the conductive paste and thesolder because of a resin component included in the conductive paste.

In addition, the height of the solder bump electrode obtained by thesolder immersing method is on the order 30 μm at maximum in the case ofan electrode having one side length of 100 μm. This is effective in thecase that the height of the solder bump electrode is not so required asin TAB (Tape Automated Bonding), but has become difficult to apply to apackaging for mounting on a printed circuit substrate. In the method forprinting and reflowing the solder paste, on the other hand, it wasdifficult to obtain a sufficient bump height in comparison with the areain which the solder is printed.

SUMMARY OF THE INVENTION

Accordingly, it is an object of the present invention to provide asemiconductor device and a method for manufacturing the same, which haveovercome the above mentioned defect of the prior art.

Another object of the present invention is to provide a semiconductordevice and a method for manufacturing the same, capable of increasingthe height of the solder bump electrode and also capable of uniformizingthe height of the obtained solder bump electrodes.

Still another object of the present invention is to provide asemiconductor device and a method for manufacturing the same, capable ofhaving an elevated reliability of connection after being mounted.

A further object of the present invention is to provide a semiconductordevice and a method for manufacturing the same, capable of forming, inbundle, and at a low cost, bump electrodes having an elevatedreliability of connection after being mounted.

A feature of the present invention lies in a semiconductor deviceincluding a semiconductor device chip mounted on a substrate and asolder bump electrode formed on an electrode film of the substrate,wherein the semiconductor device includes a conductive paste formed inthe form of a pillar on a first surface portion of the electrode film,and a solder bump electrode formed to cover the pillar-form conductivepaste and a second surface portion of the electrode film on which thepillar-form conductive paste is not formed. Here, it is preferred thatthe first surface portion is positioned on a center of the electrodefilm, and the second surface portion is positioned on a periphery of theelectrode film. Furthermore, a surface of the electrode film ispreferably plated with gold. In addition, a circuit element mounted onthe substrate can be one or more electronic parts including thesemiconductor device chip. Moreover, the conductive paste preferablyincludes a Cu powder as conductive filler.

Another feature of the present invention lies in a method formanufacturing a semiconductor device, comprising the steps of forming aconductive paste in the form of a pillar on a first surface portion of awhole surface of an electrode film on a substrate, by means of aprinting method, and forming a solder bump electrode to cover thepillar-form conductive paste and a second surface portion of theelectrode film on which the pillar-form conductive paste is not formed.Here, it is preferred that after the conductive paste is formed in theform of the pillar by means of the printing method, the pillar-formconductive paste is cured by a heat treatment. The solder bump electrodecan be formed by printing a solder paste to cover the pillar-formconductive paste and the second surface portion of the electrode film onwhich the pillar-form conductive paste is not formed, and then,reflow-melting the printed solder paste. Alternatively, the solder bumpelectrode can be formed by a solder immersing method.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagrammatic sectional view of a prior art semiconductordevice;

FIGS. 2A, 2B and 2C are diagrammatic sectional views of a semiconductordevice, for illustrating a first embodiment of the method in accordancewith the present invention for manufacturing the semiconductor device;

FIGS. 3A and 3B are diagrammatic sectional views of a semiconductordevice, for illustrating a second embodiment of the method in accordancewith the present invention for manufacturing the semiconductor device;and

FIG. 4 is a diagrammatic sectional view of a semiconductor devicepackage, for illustrating an example in which the semiconductor devicein accordance with the present invention is applied to the package.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Now, embodiments of the semiconductor device in accordance with thepresent invention and the method in accordance with the presentinvention for manufacturing the semiconductor device will be describedwith reference to the accompanying drawings. FIGS. 2A, 2B and 2C arediagrammatic sectional views of a semiconductor device, for illustratinga first embodiment of the method in accordance with the presentinvention for manufacturing the semiconductor device.

First, as shown in FIG. 2A, a pattern of a conductor film 2 is formed ona first principal surface (upper surface in the drawing) of a circuitsubstrate 1, and the first principal surface of the circuit substrate 1including the conductor film 2 is coated with a solder resist 3. Anopening is formed in the solder resist 3, and a portion of the conductorfilm 2 exposed in the opening constitutes an electrode film 4, namely,an electrode pad. In general cases, this circuit substrate is asubstrate constituting a package of the semiconductor device.

Although not shown in the drawing, one or more electronic componentsincluding a semiconductor device chip are mounted on a conductor filmpattern in a second principal surface (lower surface in the drawing) ofthe circuit substrate, so that a circuit is constructed, and connectedthrough a through hole and the conductor film 2 to the electrode film(electrode pad) 4. Alternatively, one or more electronic componentsincluding a semiconductor device chip are mounted on a conductor filmpattern in a recess formed in the first principal surface of the circuitsubstrate, so that a circuit is constructed, and connected through theconductor film 2 to the electrode film (electrode pad) 4.

A conductive paste 5 is printed on the electrode film 4 formed of theconductor film 2, to form a projection 5 in the form of a pillar on acenter of the electrode film 4, while maintaining a surface of aperipheral portion of the electrode film 4 in an exposed condition.

For example, when a printed circuit substrate is used as the circuitsubstrate 1, a surface of the conductor films 2 and 4 formed of copperor nickel is plated with gold. Namely, a surface treatment is carriedout to obtain a surface having a good solder wettability and a goodbonding property to the conductive paste.

Assuming that the size of the electrode film 4, namely, the size in aplan view of the opening of the solder resist 3, is 0.6 mm in diameter,the size in a plan view of the conductive paste 5 can be 0.25 mm indiameter, and the height of the conductive paste 5 can be on the orderof 0.2 mm to 0.4 mm.

In ordinary cases, the pitch of the electrode films on the circuitsubstrate is on the order of 0.4 mm to 2.54 mm, and the diameter of theelectrode film 4 is correspondingly on the order of 0.2 mm to 2.0 mm.Considering the fact that the diameter of the pillar-form conductivepaste 5 is smaller than the diameter of the conductor film 4 and a maskpatterning limit for printing the pillar-form conductive paste 5, it ispreferred that the diameter of the pillar-form conductive paste 5 is inthe range of 0.05 mm to 1.5 mm, and the height of the pillar-formconductive paste 5 is in the range of 0.03 mm to 1.0 mm.

The conductive paste includes copper powder as a conductive agent, andis cured at 150° C. for about 60 minutes. At this time, the curing isperformed in an inert gas, so that a solder wettability can be ensuredafter curing. The shape and the size of the conductive paste can bechanged depending upon the size of the substrate electrode, but it isrequired that a portion of the surface of the substrate electroderemains exposed.

More specifically, the conductive paste includes an electrolytic copperpowder as a filler conductive agent, and a phenolic resin or epoxy resinas a binder, and has viscosity of 50 to 2000 P (poise). If necessary,anti-oxidant is added. The curing is performed at 150° C. for one hourto four hours.

Thereafter, as shown in FIG. 2B, a solder paste 6 is printed to coverthe pillar-form conductive paste 5 and the electrode film 4 exposed inthe opening on the substrate. In the case that the diameter of theelectrode film 4 is on the order of 0.6 mm, the solder paste 6 isprinted to have a diameter of 0.8 mm and a height of 0.5 mm to 0.8 mm.

For example, the solder paste is composed of solder particles formed ofan alloy of Sn, Pb, Ag, In and/or Bi and having a particle diameter of10 μm to 70 μm, the solder particles being mixed with a rosin flux or awater-soluble flux.

Then, as shown in FIG. 2C, the solder paste is reflowed and molten sothat a solder bump electrode 7A is obtained. In the case of a eutecticsolder (having a melting point of 183° C.), it is set that a substratesurface temperature becomes about 230° C.

In the reflow process of the solder paste, the flux which is onecomponent of the solder paste is discharged so that the volume isreduced to for example 50% to 60%. However, since the solder pasteinternally includes the conductive paste cured in the form of thepillar, the solder bump electrode can ensure a constant height

For example, in the case that, as mentioned above, the electrode fllm 4has the diameter of 0.6 mm, the pillar-form conductive paste 5 has thediameter of 0.25 mm and the height of 0.25 mm, and the solder paste 6has the diameter of 0.8 mm and the height of 0.8 mm, the solder bumpelectrode 7A is formed by reflow, to have a height of 0.4 mm and abottom area of 0.6 mm in diameter to cover all the surface of thepillar-form conductive paste 5 and a whole surface of the peripheralportion of the electrode film 4.

Thus, the semiconductor device in accordance with the embodiment of thepresent invention is obtained.

FIGS. 3A and 3B are diagrammatic sectional views for illustrating asecond embodiment of the method in accordance with the presentinvention. In FIGS. 3A and 3B, elements corresponding or similar tothose shown in FIGS. 2A to 2C given with the same Reference Numerals,and explanation thereof will be omitted for avoiding duplicateexplanation.

In FIG. 3A, a pillar-form conductive paste 5 is formed, similarly toFIG. 2A.

In this embodiment, however, a solder bump electrode 7B is formed by asolder immersing method, as shown in FIG. 3B. Since the surface of theelectrode film 3 exposed in the opening of the solder resist 3 and thesurface of the pillar-form conductive paste 5 have solder wettability,the solder bump electrode 7B can be easily formed by the solderimmersing method.

FIG. 4 is a diagrammatic sectional view for illustrating an example inwhich the semiconductor device in accordance with the first or secondembodiment of the present invention is applied to the package for thesemiconductor device. A semiconductor device chip 11 is mounted on oneprincipal surface (upper surface in the drawing) of a circuit substrate8, and electrodes on the semiconductor device chip 11 are connected toconductor film patterns of the circuit substrate by bonding wires 12. Aencapsulating resin 10 is charged into the inside of a frame 9 so thatthe semiconductor device chip is encapsulated. Thereafter, by using themethod as shown in FIGS. 2A to 2C or 3A and 3B, the pillar-formconductive paste 5 is formed on the center of the surface of theelectrode film 4 which is formed on the other principal surface (lowersurface in the drawing) of the circuit substrate 8 and which iselectrically connected to the conductor film pattern on the oneprincipal surface through a through hole. Furthermore, the solder bumpelectrode 7A (or 7B) is formed to wholly cover the conductive paste andthe peripheral portion of the surface of the electrode film 4. Thus, thesemiconductor device chip is packaged.

As seen from the above, according to the present invention, thepillar-form conductive paste is formed on the electrode film of thecircuit substrate with a portion of the electrode film being maintainedin an exposed condition, and a solder bump electrode is formed by thesolder paste printing-reflowing method or the solder immersing method.With this arrangement, the height of the solder bump electrode can beelevated, and the height of the obtained solder bump electrodes isuniformized.

In addition, the package having the structure in accordance with thepresent invention can prevent a solder from collapsing at the time ofmounting, so that it is possible to reduce inconvenience such as ashort-circuiting by solder, and to elevate reliability of connectionafter mounted.

Furthermore, since the bump electrode can be formed by the solder pasteprinting or a solder immersing, bump electrodes can be formed in bundleat a low cost.

What is claimed is:
 1. A method for manufacturing a semiconductordevice, comprising the steps of: forming a pillar-form conductive pasteon a first portion of an electrode by a printing method, and forming asolder bump to cover said pillar-form conductive paste and a secondportion of the electrode on which said pillar-form conductive paste isnot formed by printing a solder paste to cover said pillar formconductive paste and said second portion of the electrode on which saidpillar-form conductive paste is not formed, and then reflow-melting theprinted solder paste.
 2. A method for manufacturing a semiconductordevice, claimed in claim 1, wherein after said conductive paste isformed in the form of a pillar by means of the printing method, saidpillar-form conductive paste is cured by a heat treatment in an inertgas.
 3. A method for manufacturing a semiconductor device, comprisingthe steps of: forming a pillar-form conductive paste on a first portionof an electrode by a printing method, and forming a solder bump to coversaid pillar-form conductive paste and a second portion of the electrodeon which said pillar-form conductive paste is not formed by a solderimmersing method.
 4. The method claimed in claim 3, wherein after saidconductive paste is formed in the form of a pillar by means of theprinting method, said pillar-form conductive paste is cured by a heattreatment in an inert gas.
 5. The method claimed in claim 3, whereinsaid conductive paste includes Cu powder as a conductive filler.
 6. Themethod claimed in claim 1, wherein said conductive paste includes Cupowder as a conductive filler.